Granted Patent
Utility
US 6,562,549 · App. 10/136,251
Method of manufacturing photomasks by plasma etching with resist stripped
Inventors:
Rick Zemen, Tiecheng Zhou
Patented Case
View Patent ↗
Granted: May 13, 2003
Filed: Apr 29, 2002
Inventors
Rick Zemen
Tiecheng Zhou
Assignee (at issue)
PHOTRONICS, INC.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.