IP Library Granted Patent US 6,566,232
Granted Patent Utility
US 6,566,232 · App. 09/691,112

Method of fabricating semiconductor device

Inventors: Akitoshi Hara, Eiichi Sato
Patented Case View Patent ↗
Granted: May 20, 2003 Filed: Oct 19, 2000
Inventors
Akitoshi Hara
Eiichi Sato
Assignee (at issue)
SEIKO EPSON CORPORATION

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Quick Facts
Patent No.
US 6,566,232
App. No.
09/691,112
Filed
2000-10-19
Granted
2003-05-20
Kind
B1