IP Library Granted Patent US 6,566,239
Granted Patent Utility
US 6,566,239 · App. 09/867,545

Semiconductor device manufacturing method having a step of forming a post terminal on a wiring by electroless plating

Inventors: Yutaka Makino, Eiji Watanabe, Hirohisa Matsuki, Tetsuya Fujisawa
Patented Case View Patent ↗
Granted: May 20, 2003 Filed: May 31, 2001
Inventors
Yutaka Makino
Eiji Watanabe
Hirohisa Matsuki
Tetsuya Fujisawa
Assignee (at issue)
Fujitsu Limited

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Quick Facts
Patent No.
US 6,566,239
App. No.
09/867,545
Filed
2001-05-31
Granted
2003-05-20
Kind
B2