IP Library Granted Patent US 6,567,450
Granted Patent Utility
US 6,567,450 · App. 09/943,343

Very narrow band, two chamber, high rep rate gas discharge laser system

Inventors: David W. Myers, Herve A. Besaucele, Alexander I. Ershov, William N. Partlo, Richard L. Sandstrom, Palash P. Das, Stuart L. Anderson, Igor V. Fomenkov, Richard C. Ujazdowski, Xiaojiang Pan, Eckehard D. Onkels, Richard M. Ness, Daniel J. W. Brown
Patented Case View Patent ↗
Granted: May 20, 2003 Filed: Aug 29, 2001
Inventors
David W. Myers
Herve A. Besaucele
Alexander I. Ershov
William N. Partlo
Richard L. Sandstrom
Palash P. Das
Stuart L. Anderson
Igor V. Fomenkov
Richard C. Ujazdowski
Xiaojiang Pan
Eckehard D. Onkels
Richard M. Ness
Daniel J. W. Brown
Assignee (at issue)
Cymer, LLC

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Quick Facts
Patent No.
US 6,567,450
App. No.
09/943,343
Filed
2001-08-29
Granted
2003-05-20
Kind
B2