Granted Patent
Utility
US 6,569,692 · App. 09/776,087
Automated method of controlling photoresist develop time to control critical dimensions, and system for accomplishing same
Inventors:
Christopher A. Bode, Joyce S. Oey Hewett
Patented Case
View Patent ↗
Granted: May 27, 2003
Filed: Feb 2, 2001
Inventors
Christopher A. Bode
Joyce S. Oey Hewett
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.