Method of removing silicon nitride film formed on a surface of a material with a process gas containing a higher-order fluorocarbon in combination with a lower-order fluorocarbon

Granted: May 27, 2003 Filed: Apr 18, 2002

This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.