Granted Patent
Utility
US 6,572,925 · App. 09/792,683
Process for forming a low dielectric constant fluorine and carbon containing silicon oxide dielectric material
Inventors:
Vladimir Zubkov, Sheldon Aronowitz
Patented Case
View Patent ↗
Granted: Jun 3, 2003
Filed: Feb 23, 2001
Inventors
Vladimir Zubkov
Sheldon Aronowitz
Assignee (at issue)
LSI Logic Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.