Granted Patent
Utility
US 6,576,538 · App. 09/945,567
Technique for high efficiency metalorganic chemical vapor deposition
Inventors:
Weimin Li, Sam Yang
Patented Case
View Patent ↗
Granted: Jun 10, 2003
Filed: Aug 30, 2001
Inventors
Weimin Li
Sam Yang
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.