Granted Patent
Utility
US 6,576,559 · App. 10/095,066
Semiconductor manufacturing methods, plasma processing methods and plasma processing apparatuses
Inventors:
Toshihiko Nakata, Takanori Ninomiya, Sachio Uto, Hiroyuki Nakano
Patented Case
View Patent ↗
Granted: Jun 10, 2003
Filed: Mar 12, 2002
Inventors
Toshihiko Nakata
Takanori Ninomiya
Sachio Uto
Hiroyuki Nakano
Assignee (at issue)
HITACHI, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.