Granted Patent
Utility
US 6,576,573 · App. 09/781,037
Atmospheric pressure plasma enhanced abatement of semiconductor process effluent species
Inventor:
Jose I. Arno
Patented Case
View Patent ↗
Granted: Jun 10, 2003
Filed: Feb 9, 2001
Inventor
Jose I. Arno
Assignee (at issue)
ADVANCED TECHNOLOGY & MATERIALS CO., LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.