Granted Patent
Utility
US 6,579,769 · App. 09/726,384
Semiconductor device manufacturing method including forming FOX with dual oxidation
Inventors:
Hiroyuki Shimada, Masaaki Higashitani, Hideo Kurihara, Hideki Komori, Satoshi Takahashi
Patented Case
View Patent ↗
Granted: Jun 17, 2003
Filed: Dec 1, 2000
Inventors
Hiroyuki Shimada
Masaaki Higashitani
Hideo Kurihara
Hideki Komori
Satoshi Takahashi
Assignees (at issue)
Fujitsu Limited
Advanced Micro Devices, Inc.
Fujitsu AMD Semiconductor Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.