Granted Patent
Utility
US 6,581,669 · App. 09/829,434
Sputtering target for depositing silicon layers in their nitride or oxide form and a process for its preparation
Inventors:
Martin Weigert, Uwe Konietzka
Patented Case
View Patent ↗
Granted: Jun 24, 2003
Filed: Apr 10, 2001
Inventors
Martin Weigert
Uwe Konietzka
Assignee (at issue)
W.C. Heraeus GmbH & Co. KG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.