Granted Patent
Utility
US 6,582,617 · App. 09/302,170
Plasma etching using polycarbonate mask and low-pressure high density plasma
Inventor:
Chungdee Pong
Patented Case
View Patent ↗
Granted: Jun 24, 2003
Filed: Apr 29, 1999
Inventor
Chungdee Pong
Assignee (at issue)
Candescent Technologies Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.