Granted Patent
Utility
US 6,586,348 · App. 09/850,585
Method for preventing etching-induced damage to a metal oxide film by patterning the film after a nucleation anneal but while still amorphous and then thermally annealing to crystallize
Inventors:
Walter Hartner, Gunther Schindler, Frank Hintermaier, Volker Weinrich
Patented Case
View Patent ↗
Granted: Jul 1, 2003
Filed: May 7, 2001
Inventors
Walter Hartner
Gunther Schindler
Frank Hintermaier
Volker Weinrich
Assignee (at issue)
Infineon Technologies AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.