Granted Patent
Utility
US 6,592,939 · App. 09/875,596
System for and method of using developer as a solvent to spread photoresist faster and reduce photoresist consumption
Inventor:
James Yu
Patented Case
View Patent ↗
Granted: Jul 15, 2003
Filed: Jun 6, 2001
Inventor
James Yu
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.