IP Library Granted Patent US 6,593,239
Granted Patent Utility
US 6,593,239 · App. 09/366,588

Chemical mechanical polishing method useful for copper substrates

Inventors: Vlasta Brusic Kaufman, Rodney Kistler
Patented Case View Patent ↗
Granted: Jul 15, 2003 Filed: Aug 4, 1999
Inventors
Vlasta Brusic Kaufman
Rodney Kistler
Assignee (at issue)
Cabot Microelectronics Corporation

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Quick Facts
Patent No.
US 6,593,239
App. No.
09/366,588
Filed
1999-08-04
Granted
2003-07-15
Kind
B2