Granted Patent
Utility
US 6,593,584 · App. 09/745,940
Multi-beam lithography apparatus with mutually different beam limiting apertures
Inventors:
Jan Martijn Krans, Peter Christiaan Tiemeijer
Patented Case
View Patent ↗
Granted: Jul 15, 2003
Filed: Dec 22, 2000
Inventors
Jan Martijn Krans
Peter Christiaan Tiemeijer
Assignee (at issue)
FEI Company
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.