Granted Patent
Utility
US 6,596,593 · App. 09/997,825
Method of manufacturing semiconductor device employing oxygen implantation
Inventor:
Kazutoshi Ishii
Patented Case
View Patent ↗
Granted: Jul 22, 2003
Filed: Nov 30, 2001
Inventor
Kazutoshi Ishii
Assignee (at issue)
SEIKO INSTRUMENTS INC.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.