IP Library Granted Patent US 6,602,785
Granted Patent Utility
US 6,602,785 · App. 09/614,361

Method of forming a conductive contact on a substrate and method of processing a semiconductor substrate using an ozone treatment

Inventors: Sujit Sharan, Gurtej S. Sandhu, Terry L. Gilton
Patented Case View Patent ↗
Granted: Aug 5, 2003 Filed: Jul 12, 2000
Inventors
Sujit Sharan
Gurtej S. Sandhu
Terry L. Gilton
Assignee (at issue)
Micron Technology, Inc.

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Quick Facts
Patent No.
US 6,602,785
App. No.
09/614,361
Filed
2000-07-12
Granted
2003-08-05
Kind
B1