Granted Patent
Utility
US 6,605,411 · App. 09/782,283
Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask
Inventor:
Shuji Nakao
Patented Case
View Patent ↗
Granted: Aug 12, 2003
Filed: Feb 14, 2001
Inventor
Shuji Nakao
Assignee (at issue)
MITSUBISHI ELECTRIC CORPORATION
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.