Granted Patent
Utility
US 6,605,848 · App. 10/246,267
Semiconductor device with metal gate electrode and silicon oxynitride spacer
Inventors:
Minh Van Ngo, Arvind Halliyal
Patented Case
View Patent ↗
Granted: Aug 12, 2003
Filed: Sep 18, 2002
Inventors
Minh Van Ngo
Arvind Halliyal
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.