IP Library Granted Patent US 6,605,863
Granted Patent Utility
US 6,605,863 · App. 10/178,398

Low k film application for interlevel dielectric and method of cleaning etched features

Inventors: Zhiping Yin, Gary Chen
Patented Case View Patent ↗
Granted: Aug 12, 2003 Filed: Jun 24, 2002
Inventors
Zhiping Yin
Gary Chen
Assignee (at issue)
Micron Technology, Inc.

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Quick Facts
Patent No.
US 6,605,863
App. No.
10/178,398
Filed
2002-06-24
Granted
2003-08-12
Kind
B2