IP Library Granted Patent US 6,607,925
Granted Patent Utility
US 6,607,925 · App. 10/165,837

Hard mask removal process including isolation dielectric refill

Inventors: Unsoon Kim, Dawn Hopper, Yider Wu, Krishnashree Achuthan
Patented Case View Patent ↗
Granted: Aug 19, 2003 Filed: Jun 6, 2002
Inventors
Unsoon Kim
Dawn Hopper
Yider Wu
Krishnashree Achuthan
Assignee (at issue)
Advanced Micro Devices, Inc.

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Quick Facts
Patent No.
US 6,607,925
App. No.
10/165,837
Filed
2002-06-06
Granted
2003-08-19
Kind
B1