Granted Patent
Utility
US 6,607,968 · App. 10/018,680
Method for making a silicon substrate comprising a buried thin silicon oxide film
Inventors:
Malgorzata Jurczak, Thomas Skotnicki
Patented Case
View Patent ↗
Granted: Aug 19, 2003
Filed: Apr 22, 2002
Inventors
Malgorzata Jurczak
Thomas Skotnicki
Assignee (at issue)
FRANCE TELECOM
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.