Granted Patent
Utility
US 6,614,005 · App. 09/979,646
Device and method for thermally treating substrates
Inventors:
Heinrich Walk, Roland Mader, Werner Blersch, Markus Hauf
Patented Case
View Patent ↗
Granted: Sep 2, 2003
Filed: Dec 13, 2001
Inventors
Heinrich Walk
Roland Mader
Werner Blersch
Markus Hauf
Assignee (at issue)
Steag RTP Systems GmbH
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.