Granted Patent
Utility
US 6,635,409 · App. 09/902,568
Method of strengthening photoresist to prevent pattern collapse
Inventors:
Christopher F. Lyons, Scott A. Bell, Todd P. Lukanc, Marina V. Plat
Patented Case
View Patent ↗
Granted: Oct 21, 2003
Filed: Jul 12, 2001
Inventors
Christopher F. Lyons
Scott A. Bell
Todd P. Lukanc
Marina V. Plat
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.