Granted Patent
Utility
US 6,645,862 · App. 09/989,550
Double-side polishing process with reduced scratch rate and device for carrying out the process
Inventors:
Guido Wenski, Johann Glas, Thomas Altmann, Gerhard Heier
Patented Case
View Patent ↗
Granted: Nov 11, 2003
Filed: Nov 20, 2001
Inventors
Guido Wenski
Johann Glas
Thomas Altmann
Gerhard Heier
Assignee (at issue)
Wacker Siltronic Gesellschaft Fur Halbleitermaterialien AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.