Granted Patent
Utility
US 6,653,053 · App. 09/940,241
Method of forming a pattern on a semiconductor wafer using an attenuated phase shifting reflective mask
Inventors:
Pawitter Mangat, Sang In Han
Patented Case
View Patent ↗
Granted: Nov 25, 2003
Filed: Aug 27, 2001
Inventors
Pawitter Mangat
Sang In Han
Assignee (at issue)
Motorola, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.