IP Library › Granted Patent US 6,653,698
Granted Patent Utility
US 6,653,698 · App. 10/034,009

Integration of dual workfunction metal gate CMOS devices

Inventors: Byoung Hun Lee, Effendi Leobandung, Ghavam G. Shahidi
Patented Case View Patent ↗
Granted: Nov 25, 2003 Filed: Dec 20, 2001
Inventors
Byoung Hun Lee
Effendi Leobandung
Ghavam G. Shahidi
Assignee (at issue)
International Business Machines Corporation

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Quick Facts
Patent No.
US 6,653,698
App. No.
10/034,009
Filed
2001-12-20
Granted
2003-11-25
Kind
B2