IP Library Granted Patent US 6,656,021
Granted Patent Utility
US 6,656,021 · App. 09/940,880

Process for fabricating a semiconductor device

Inventors: Katsuhiro Ota, Akio Saito
Patented Case View Patent ↗
Granted: Dec 2, 2003 Filed: Aug 29, 2001
Inventors
Katsuhiro Ota
Akio Saito
Assignee (at issue)
HITACHI, LTD.

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Quick Facts
Patent No.
US 6,656,021
App. No.
09/940,880
Filed
2001-08-29
Granted
2003-12-02
Kind
B2