IP Library Granted Patent US 6,673,639
Granted Patent Utility
US 6,673,639 · App. 10/072,997

Method and system for evaluating polysilicon, and method and system for fabricating thin film transistor

Inventors: Hiroyuki Wada, Nobuhiko Umezu, Koichi Tatsuki
Patented Case View Patent ↗
Granted: Jan 6, 2004 Filed: Feb 12, 2002
Inventors
Hiroyuki Wada
Nobuhiko Umezu
Koichi Tatsuki
Assignee (at issue)
SONY GROUP CORPORATION

This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.

Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 6,673,639
App. No.
10/072,997
Filed
2002-02-12
Granted
2004-01-06
Kind
B2