Granted Patent
Utility
US 6,680,263 · App. 10/074,195
Method for applying a photoresist layer to a substrate having a preexisting topology
Inventors:
Alfredo M. Morales, Marcela Gonzales
Patented Case
View Patent ↗
Granted: Jan 20, 2004
Filed: Feb 12, 2002
Inventors
Alfredo M. Morales
Marcela Gonzales
Assignee (at issue)
Sandia National Laboratory
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.