IP Library Granted Patent US 6,686,098
Granted Patent Utility
US 6,686,098 · App. 09/729,062

Lithography method and lithography mask

Inventors: Gunther Czech, Christoph Friedrich, Carsten Fülber, Rainer Käsmaier, Dietrich Widmann
Patented Case View Patent ↗
Granted: Feb 3, 2004 Filed: Dec 4, 2000
Inventors
Gunther Czech
Christoph Friedrich
Carsten Fülber
Rainer Käsmaier
Dietrich Widmann
Assignee (at issue)
Infineon Technologies AG

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Quick Facts
Patent No.
US 6,686,098
App. No.
09/729,062
Filed
2000-12-04
Granted
2004-02-03
Kind
B2