Granted Patent
Utility
US 6,686,099 · App. 09/954,065
Method of manufacturing a photomask
Inventors:
Toshihiko Tanaka, Norio Hasegawa, Tsuneo Terasawa
Patented Case
View Patent ↗
Granted: Feb 3, 2004
Filed: Sep 18, 2001
Inventors
Toshihiko Tanaka
Norio Hasegawa
Tsuneo Terasawa
Assignee (at issue)
Renesas Technology Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.