Granted Patent
Utility
US 6,686,429 · App. 09/854,312
Polymer suitable for photoresist compositions
Inventors:
Ralph R. Dammel, Raj Sakamuri
Patented Case
View Patent ↗
Granted: Feb 3, 2004
Filed: May 11, 2001
Inventors
Ralph R. Dammel
Raj Sakamuri
Assignee (at issue)
Clariant Finance (BVI) Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.