IP Library Granted Patent US 6,689,536
Granted Patent Utility
US 6,689,536 · App. 10/033,899

Pattern formation material and pattern formation method

Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Masamitsu Shirai, Masahiro Tsunooka
Patented Case View Patent ↗
Granted: Feb 10, 2004 Filed: Jan 3, 2002
Inventors
Shinji Kishimura
Masayuki Endo
Masaru Sasago
Masamitsu Shirai
Masahiro Tsunooka
Assignee (at issue)
SUMITOMO ELECTRIC INDUSTRIES, LTD.

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Quick Facts
Patent No.
US 6,689,536
App. No.
10/033,899
Filed
2002-01-03
Granted
2004-02-10
Kind
B2