Granted Patent
Utility
US 6,689,541 · App. 09/884,182
Process for forming a photoresist mask
Inventors:
Scott A. Bell, Todd P. Lukanc, Christopher F. Lyons, Marina V. Plat, Ramkumar Subramanian
Patented Case
View Patent ↗
Granted: Feb 10, 2004
Filed: Jun 19, 2001
Inventors
Scott A. Bell
Todd P. Lukanc
Christopher F. Lyons
Marina V. Plat
Ramkumar Subramanian
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.