Granted Patent
Utility
US 6,692,877 · App. 09/982,051
Mask for beam exposure having membrane structure and stencil structure and method for manufacturing the same
Inventor:
Yasuhisa Yamada
Patented Case
View Patent ↗
Granted: Feb 17, 2004
Filed: Oct 17, 2001
Inventor
Yasuhisa Yamada
Assignee (at issue)
NEC Electronics Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.