Granted Patent
Utility
US 6,693,022 · App. 10/226,764
CVD method of producing in situ-doped polysilicon layers and polysilicon layered structures
Inventors:
Joerg Dreybrodt, Dirk Drescher, Ralf Zedlitz, Stephan Wege
Patented Case
View Patent ↗
Granted: Feb 17, 2004
Filed: Aug 23, 2002
Inventors
Joerg Dreybrodt
Dirk Drescher
Ralf Zedlitz
Stephan Wege
Assignee (at issue)
Infineon Technologies AG
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.