Granted Patent
Utility
US 6,704,089 · App. 09/842,203
Lithographic projection apparatus, a method for determining a position of a substrate alignment mark, a device manufacturing method and device manufactured thereby
Inventors:
Maurits Van Der Schaar, Irwan Dani Setija, Everhardus Cornelis Mos
Patented Case
View Patent ↗
Granted: Mar 9, 2004
Filed: Apr 26, 2001
Inventors
Maurits Van Der Schaar
Irwan Dani Setija
Everhardus Cornelis Mos
Assignee (at issue)
ASML NETHERLANDS B.V.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.