Granted Patent
Utility
US 6,706,540 · App. 10/361,585
Method of manufacturing a semiconductor device with a hydrogen barrier layer
Inventors:
Yukinobu Hikosaka, Yasutaka Ozaki, Kazuaki Takai
Patented Case
View Patent ↗
Granted: Mar 16, 2004
Filed: Feb 11, 2003
Inventors
Yukinobu Hikosaka
Yasutaka Ozaki
Kazuaki Takai
Assignee (at issue)
Fujitsu Limited
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.