Granted Patent
Utility
US 6,706,576 · App. 10/096,741
Laser thermal annealing of silicon nitride for increased density and etch selectivity
Inventors:
Minh Van Ngo, Angela T. Hui
Patented Case
View Patent ↗
Granted: Mar 16, 2004
Filed: Mar 14, 2002
Inventors
Minh Van Ngo
Angela T. Hui
Assignee (at issue)
Advanced Micro Devices, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.