Granted Patent
Utility
US 6,709,554 · App. 09/802,342
Method and apparatus for repairing lithography masks using a charged particle beam system
Inventors:
David C. Ferranti, Sharon M. Szelag, J. David Casey, Jr.
Patented Case
View Patent ↗
Granted: Mar 23, 2004
Filed: Mar 9, 2001
Inventors
David C. Ferranti
Sharon M. Szelag
J. David Casey, Jr.
Assignee (at issue)
FEI Company
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.