Granted Patent
Utility
US 6,709,792 · App. 10/163,554
Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask
Inventor:
Shuji Nakao
Patented Case
View Patent ↗
Granted: Mar 23, 2004
Filed: Jun 7, 2002
Inventor
Shuji Nakao
Assignee (at issue)
Renesas Technology Corporation
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.