Granted Patent
Utility
US 6,709,930 · App. 10/176,570
Thicker oxide formation at the trench bottom by selective oxide deposition
Inventors:
Ben Chan, Kam Hong Lui, Christiana Yue, Ronald Wong, David Chang, Frederick P. Giles, Kyle Terrill, Mohamed N. Darwish, Deva Pattanayak, Robert Xu, Kuo-In Chen
Patented Case
View Patent ↗
Granted: Mar 23, 2004
Filed: Jun 21, 2002
Inventors
Ben Chan
Kam Hong Lui
Christiana Yue
Ronald Wong
David Chang
Frederick P. Giles
Kyle Terrill
Mohamed N. Darwish
Deva Pattanayak
Robert Xu
Kuo-In Chen
Assignee (at issue)
SILICONIX INCORPORATED
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.