Granted Patent
Utility
US 6,709,945 · App. 09/765,885
Reduced aspect ratio digit line contact process flow used during the formation of a semiconductor device
Inventor:
Brent A. McClure
Patented Case
View Patent ↗
Granted: Mar 23, 2004
Filed: Jan 16, 2001
Inventor
Brent A. McClure
Assignee (at issue)
Micron Technology, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.