IP Library Granted Patent US 6,710,845
Granted Patent Utility
US 6,710,845 · App. 09/752,938

Purging gas from a photolithography enclosure between a mask protective device and a patterned mask

Inventors: Han-Ming Wu, Ronald J. Kuse
Patented Case View Patent ↗
Granted: Mar 23, 2004 Filed: Dec 29, 2000
Inventors
Han-Ming Wu
Ronald J. Kuse
Assignee (at issue)
Intel Corporation

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Quick Facts
Patent No.
US 6,710,845
App. No.
09/752,938
Filed
2000-12-29
Granted
2004-03-23
Kind
B2