Granted Patent
Utility
US 6,712,928 · App. 09/791,677
Method and its apparatus for detecting floating particles in a plasma processing chamber and an apparatus for processing a semiconductor device
Inventors:
Hiroyuki Nakano, Toshihiko Nakata
Patented Case
View Patent ↗
Granted: Mar 30, 2004
Filed: Feb 26, 2001
Inventors
Hiroyuki Nakano
Toshihiko Nakata
Assignee (at issue)
HITACHI, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.