Granted Patent
Utility
US 6,716,476 · App. 09/956,916
Method of depositing an optical quality silica film by PECVD
Inventors:
Luc Ouellet, Jonathan Lachance
Patented Case
View Patent ↗
Granted: Apr 6, 2004
Filed: Sep 21, 2001
Inventors
Luc Ouellet
Jonathan Lachance
Assignee (at issue)
DALSA Semiconductor Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.