Granted Patent
Utility
US 6,723,183 · App. 09/980,946
Silicide target for depositing less embrittling gate oxide and method of manufacturing silicide target
Inventors:
Kunihiro Oda, Hirohito Miyashita
Patented Case
View Patent ↗
Granted: Apr 20, 2004
Filed: Dec 5, 2001
Inventors
Kunihiro Oda
Hirohito Miyashita
Assignee (at issue)
Nikko-Materials Co., Ltd.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.